tag: 10nm

Executive Insight: Satish Bagalkotkar
By Ed Sperling - 23 Jul, 2014 - Comments: 1

Semiconductor Engineering sat down with Satish Bagalkotkar, president and CEO of design services company Synapse Design to talk about massive shifts in the semiconductor industry and his vision of how these changes will alter the landscape, from chipmakers to design services to what gets built and how it will get used. What follows are excerpts of that interview. SE: What worries you most? ... » read more

DFM And Multipatterning
By Ed Sperling - 17 Jul, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss DFM at advanced nodes with Kuang-Kuo Lin, director of foundry design enablement at Samsung Electronics; Jongwook Kye, lithography modeling and architecture fellow at GlobalFoundries; David Abercrombie, advanced physical verification methodology program manager at Mentor Graphics; Ya-Chieh Lai, engineering director for DFM/CLS silicon signoff and ver... » read more

All Roads Point Up…But When?
By Ed Sperling - 17 Jul, 2014 - Comments: 0

One of the clear messages at Semicon West this month was that stacked die are coming soon. The only question is how soon. This isn’t so simple to answer. It depends on a lot of factors, and for most of them there aren’t any clear answers. First of all, no one is certain what the cost equation will look like at 14/16nm, particularly once the process technology becomes more mature. Ther... » read more

Confusion Does Not Equal Paralysis
By Ed Sperling - 10 Jul, 2014 - Comments: 0

After attending the two biggest semiconductor conferences in the world, along with a long list of notable conferences targeted to a wide variety of technologies and engineering disciplines, it’s clear the industry is racing ahead. But “ahead” is now a relative term. While Moore’s Law satisfied both economic and technological requirements, it was easy to figure out what “ahead” me... » read more

Stacked Die Are Coming Soon. Really
By Ed Sperling - 10 Jul, 2014 - Comments: 3

Since the beginning of the decade there have been many predictions that stacked die were just over the hill, but the time it has taken to climb that hill has been longer than most people would have anticipated. In fact, TSMC has been fully capable of building stacked die since last year, with risk production expected to be completed by year, according to Gartner. But something very fundament... » read more

All Together Now!
By Karen Savala - 30 Jun, 2014 - Comments: 0

Consolidation is changing the face of our industry. It is tempting to think that a narrower more consolidated industry is easier to navigate and might require less facilitated coordination and collaboration. However, it turns out the reverse is true. With fewer, but much bigger companies, the bets become exponentially bigger.  At the same time technical challenges — such as advanced tra... » read more

EDA Races To 7nm, Despite Litho Uncertainties
By Ann Mutschler - 16 May, 2014 - Comments: 0

It’s becoming almost painful to refer to the delay with EUV, but it certainly isn’t stopping anyone on the design side from tweaking design tools or working on test chips. Clearly, things are moving ahead to 7nm even though lithography plans aren't yet clear. Steve Carlson, group marketing director in Cadence’s Office of Chief Strategy, said with regard to EUV, “They have the power p... » read more

The Bumpy Road To FinFETs
By Mark LaPedus - 15 May, 2014 - Comments: 2

The shift from planar transistors to finFETs is a major inflection point in the IC industry. FinFETs are expected to enable higher performance chips at lower voltages. And the next-generation transistor technology also could allow the industry to extend CMOS to the 10nm node and perhaps beyond. But as it turns out, finFET technology is also harder to master than previously thought. For exam... » read more

One-On-One: Linyong Pang
By Mark LaPedus - 12 May, 2014 - Comments: 1

Semiconductor Engineering sat down to discuss trends in the lithography and photomask business with Linyong “Leo” Pang, the new chief product officer and executive vice president at D2S, which focuses on model-based mask data preparation as well as other mask writing technologies. What follows are excerpts of that conversation. SE: Before you arrived at D2S you were at Luminescent, whic... » read more

Stopping Mask Hotspots Before They Escape The Mask Shop
By eBeam Initiative - 28 Apr, 2014 - Comments: 3

By Aki Fujimura The same types of physics-based issues that have haunted lithography for decades have started to impact mask writing as well. The increasingly small and complex mask shapes specified by optical proximity correction (OPC) that are now required for faithful wafer lithography at 28nm-and-below nodes have given rise to an increase in mask hotspots. Mask hotspots occur when the shap... » read more

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