tag: Applied Materials

450mm: Out Of Sync
By Mark LaPedus - 18 Jul, 2013 - Comments: 0

By Mark LaPedus The IC industry has been talking about it for ages, but vendors are finally coming to terms with a monumental shift in the business. The vast changes involve a pending and critical juncture, where the 450mm wafer size transition, new device architectures and other technologies will likely converge at or near the same time. In one possible scenario, 450mm fabs are projected ... » read more

MEMS Foundries Play Waiting Game
By Mark LaPedus - 18 Jul, 2013 - Comments: 0

By Mark LaPedus For years, the foundries in the microelectromechanical systems (MEMS) business have been patiently waiting for the MEMS integrated device manufacturers (IDMs) to outsource some or all of their production. The MEMS foundries are still waiting for that development. Because MEMS are custom devices tuned to a proprietary process and toolset, IDMs still prefer to use their own f... » read more

Mobility Gets A Boost With Expanded Epi Applications
By Applied Materials Writers - 17 Jul, 2013 - Comments: 0

By Jeremy Zelenko Even as industry moves into the era of the high k metal gate (HKMG) and FinFET transistor, chipmakers continue to seek ways to improve device performance. One of the latest advances and the subject of an Applied Materials announcement made today is to extend epitaxial deposition from PMOS to NMOS transistors. Implementing an NMOS epitaxy (epi) process in addition to the estab... » read more

Seeing Spots At 10nm
By Ed Sperling - 15 Jul, 2013 - Comments: 0

By Ed Sperling The relentless march to smaller process nodes means the defects are getting smaller, more numerous, and much harder to find. That explains why Applied Materials and KLA-Tencor both introduced new defect review and classification tools last week. The move to the 1x nm is on the top of both companies’ agendas, and with that comes defects on the walls of finFETs in addition to... » read more

The Week In Review: July 15
By Mark LaPedus - 15 Jul, 2013 - Comments: 0

By Mark LaPedus There are more problems surfacing with extreme ultraviolet (EUV) lithography. Yes, the light source remains a problem, but the resists appear to be in decent shape. “The next challenge is the mask blank,” said Stefan Wurm, director of Sematech’s lithography program. The new problem involves ion beam deposition, which apparently is causing defects and overfill on EUV masks... » read more

New Approaches To Better Performance And Lower Power
By Ed Sperling - 11 Jul, 2013 - Comments: 0

By Ed Sperling Until 90nm, every feature shrink and rev of Moore’s Law included a side benefit of better power and performance. After that, improvements involved everything from different back-end processes to copper interconnects and transistor structures. But from 20nm onward, the future will rest with a combination of new materials, new architectures and new packaging approaches—and som... » read more

Speeding Up NMOS
By Ed Sperling - 08 Jul, 2013 - Comments: 0

By Ed Sperling For years—decades, in fact—the NMOS transistor world has been on cruise control. NMOS is naturally faster and its performance has scaled better than PMOS. PMOS has had a cost advantage. But lately, it has been catching up in performance, too. In fact, at 20nm the two transistor types have proven nearly equal in performance—but not for long. NMOS is about to get a big bo... » read more

Medical Drives Boom In MEMS
By Ed Sperling - 20 Jun, 2013 - Comments: 0

By Mark LaPedus At a recent event, an executive from a startup called Proteus Digital Health described the medical benefits of swallowing the company’s ingestible sensors or digital pills. First, a consumer would swallow Proteus Digital’s tiny ingestible sensor, along with one’s current medication. With no battery or antenna, the stomach fluid generates the power in the ingestible sen... » read more

Inside A 450mm Metrology Consortium
By Mark LaPedus - 20 Jun, 2013 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss 450mm metrology challenges with Menachem Shoval, a former manufacturing executive at Intel and chairman of the Metro450 consortium. The Israeli-based consortium is developing metrology technology for the next-generation, 450mm wafer size. The group consists of Intel, Applied Materials, Jordan Valley, Nanomotion, Nov... » read more

Merchant Photomask Makers Remain Relevant
By Jeff Chappell - 20 Jun, 2013 - Comments: 0

By Jeff Chappell For many years the trend in the semiconductor industry with regard to photomasks and chipmakers was to shed captive mask operations in favor of merchant photomask suppliers. This reflected a larger trend all along the supply chain with many companies moving away from vertical integration as, consequently, the foundry model grew. "This was mainly driven by cost consideratio... » read more

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