tag: Toppan

Survey: Mask Complexity To Increase
By Mark LaPedus - 29 Sep, 2015 - Comments: 1

The eBeam Initiative today released its annual members’ perceptions survey, a set of results that reveals some new and surprising data about EUV, multi-beam and photomask technology. As part of the results in the new survey, there is a growing level of optimism for the implementation of extreme ultraviolet (EUV) lithography in high-volume manufacturing, as compared to last year’s results... » read more

Mask Supply Chain Preps For 10nm
By Dylan McGrath - 17 Sep, 2015 - Comments: 0

As the semiconductor industry gears up for the 10nm logic node—now likely to begin in the second half of 2017—the photomask supply chain is preparing to grapple with the associated challenges, including dramatic increases in photomask complexity, write times and data volumes. The 10nm node will require more photomasks per mask set, the ability to print smaller and more complex features, ... » read more

The Week In Review: Manufacturing And Design
By Mark LaPedus - 10 Jan, 2014 - Comments: 1

Crucial.com reveals a surprising way to gain more time for improving one's personal health: fix a slow computer. A nationwide survey revealed that U.S. adults think they waste an average of 16 minutes per day waiting for their computer to load or boot up. Equating to two hours each week and four days per year lost to the wiles of a slow computer, it's no surprise that 66% of Americans say that ... » read more

Multi-Beam Begins To Shine
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

After years of R&D and promises, multi-beam electron-beam technology is delayed and late to the market. The technology requires more funding and work than previously thought. And generally, the skepticism is running high for the technology. Finally, however, there is a ray of hope, and some momentum, in multi-beam—at least on the photomask front. Seeking to accelerate its multi-beam te... » read more

Debate Heats Up Over Bigger Glass
By Mark LaPedus - 17 Oct, 2013 - Comments: 0

For more than two decades, photomask makers have been talking about moving to a new and larger mask size, sometimes called “bigger glass” by the industry. Generally, the discussions about “bigger glass” have been all talk and no action. But now, some chipmakers are turning up the volume in the discussions and are pushing for a larger mask size. A larger mask size would require the ph... » read more

New Business Models Emerge
By Ed Sperling - 24 Sep, 2009 - Comments: 0

By Ed Sperling Globalization, complexity and the rising cost of chip development are changing business models across the semiconductor design world in some expected as well as some unusual ways. On a global basis, each new process node propels a new wave of disaggregation and disruption as the costs of design continue to skyrocket. What used to be under one roof is now shared by many. This ... » read more

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