Chip Industry Week In Review


Notable deals Cadence and Intel Foundry inked a multi-year agreement to advance design technology co-optimization and create PDKs for Intel Foundry's 14A process. Nvidia and SK hynix announced a multi-year partnership to co-develop memory technology for AI infrastructure and physical AI. Teradyne unveiled an integrated test cell solution with TEL that supports known-good device scree... » read more

Research Bits: June 8


Multi-tasking transistor Researchers at Pohang University of Science & Technology (POSTECH) developed a zinc oxide (ZnO) and tellurium (Te) heterojunction transistor technology that exhibits negative differential transconductance (NDT), where current decreases over a certain voltage range. By precisely controlling overlap length between the two materials, the team realized double negati... » read more

Chip Industry Week In Review


Computex in Taiwan: Arm and Nvidia introduced an AI PC platform, RTX Spark, with an Arm-based Grace CPU, Blackwell RTX GPU, and unified memory. Cadence announced a fully autonomous virtual agentic AI design engineer, enabling customers to run dynamic simulations in automated workflows. Intel launched Xeon 6+, its first data-center CPU built on Intel Foundry's 18A process. The company... » read more

Research Bits: May 26


Simultaneous energy generation and emission Researchers from the Institute of Science Tokyo and University of Osaka designed an organic semiconductor device that can both generate electricity from light and emit bright visible light. The researchers used two multiple-resonance thermally activated delayed fluorescence (MR-TADF) molecules, v-DABNA and QAO, in a simple layered structure. Their... » read more

Chip Industry Technical Paper Roundup: Dec. 8


New technical papers recently added to Semiconductor Engineering’s library: [table id=499 /] Find more semiconductor research papers here and in the most recent Chip Industry Week in Review.   » read more

Heat Dissipation in Solid-State Nanopore (Univ. of Osaka et al)


A new technical paper titled "Gate-Tunable Ionothermoelectric Cooling in a Solid-State Nanopore" was published by researchers at the University of Osaka, the University of Tokyo, National Institute of Advanced Industrial Science and Technology et al. The paper states: "Efficient heat dissipation at the nanoscale remains a major challenge for high-performance microelectronics. Here, we dem... » read more

Research Bits: Dec. 2


Ionothermoelectric cooling Researchers from the University of Osaka, University of Tokyo, and Japan's National Institute of Advanced Industrial Science and Technology proposed an ionothermoelectric cooling strategy for chips that enhances cooling by driving the flow of ions through nanoscale channels. “We fabricated a nanosized pore in a semiconductor membrane and surrounded the nanopore ... » read more

Research Bits: Sept. 16


Beyond-EUV resists Researchers from Johns Hopkins University, East China University of Science and Technology, École Polytechnique Fédérale de Lausanne (EPFL), Soochow University, Brookhaven National Laboratory, and Lawrence Berkeley National Laboratory propose a combination of new resist materials and a higher-powered EUV process that could enable smaller chip feature sizes. The "beyond... » read more