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Why Changes In Computing Are Driving Changes In Photomasks

How different photomask shapes can improve semiconductor reliability and performance.

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Aki Fujimura, CEO of D2S, talks with Semiconductor Engineering about massive improvements in computation based upon increased density on chips, and why printing Manhattan shapes on a photomask are no longer sufficient to print high-performance devices with predictable reliability every time. He explains why a discontinuity in EDA physical design has opened the door for printing curvilinear shapes on masks.



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