tag: EUV

Why The Next Couple Process Nodes Are So Critical
By Ed Sperling - 14 Aug, 2014 - Comments: 0

In the greater scheme of things, one process node doesn't matter all that much. In fact, it has become common practice for big chipmakers to skip nodes for some of their chips as power issues becoming increasingly complex, time-to-market windows shrink and leapfrogging is viewed as a way to maximize resources while remaining über-competitive. But the next process node, and certainly the nex... » read more

More People Use Phones Than Toothbrushes…
By Karen Savala - 11 Aug, 2014 - Comments: 0

“Business Has Only Two Functions – Marketing and Innovation” — Milan Kundera There may be more to running a successful business than marketing and innovation, but these two functions were front-and-center at SEMICON West 2014. This year’s industry gathering was an important, and positive, step forward together. Because of the gravity of the challenges facing our industry – funda... » read more

EUV Is Key To 450mm Wafers
By Katherine Derbyshire - 31 Jul, 2014 - Comments: 1

Whether the wafers in question are 200 mm in diameter, or 300 mm, or potentially 450 mm, larger wafer sizes have always been justified by manufacturing economics. If the cost to process a wafer stays the same, but the wafer contains more devices, then the cost per device goes down. For processes that apply to the entire wafer at once — etch, deposition, cleaning, and so forth — the equation... » read more

EUV Light Source Makes Progress
By Kenji Tsuda - 30 Jul, 2014 - Comments: 0

EUV Lithography light source maker, Gigaphoton has developed a laser-produced plasma (LPP) light source prototype model that can produce a maximum of 92 watts. This is more than double the 43 watts produced using a traditional LPP light source. Figure 1 conceptual diagram of EUV exposure. Source: Gigaphoton/EUVA The biggest issue with EUV lithography has been the output power of the lig... » read more

All Roads Point Up…But When?
By Ed Sperling - 17 Jul, 2014 - Comments: 0

One of the clear messages at Semicon West this month was that stacked die are coming soon. The only question is how soon. This isn’t so simple to answer. It depends on a lot of factors, and for most of them there aren’t any clear answers. First of all, no one is certain what the cost equation will look like at 14/16nm, particularly once the process technology becomes more mature. Ther... » read more

Will 7nm And 5nm Really Happen?
By Mark LaPedus - 14 Jul, 2014 - Comments: 2

Today’s silicon-based finFETs could run out of steam at 10nm. If or when chipmakers move beyond 10nm, IC vendors will require a new transistor architecture. III-V finFETs, gate-all-around FETs, quantum well finFETs, SOI finFETs and vertical nanowires are just a few of the future transistor candidates at 7nm and 5nm. Technically, it’s possible to manufacture the transistor portions of the... » read more

Stacked Die Are Coming Soon. Really
By Ed Sperling - 10 Jul, 2014 - Comments: 3

Since the beginning of the decade there have been many predictions that stacked die were just over the hill, but the time it has taken to climb that hill has been longer than most people would have anticipated. In fact, TSMC has been fully capable of building stacked die since last year, with risk production expected to be completed by year, according to Gartner. But something very fundament... » read more

How Much Multipatterning?
By Ed Sperling - 19 Jun, 2014 - Comments: 2

The latest consensus among litho experts is that extreme ultraviolet (EUV) will appear in the market sometime in coming months in a commercially viable form. The only question is the degree of commercially viability, and what it will actually cost. While some debate lingers about whether EUV will ever get going, the general feeling is that enough progress has been made recently to make it work.... » read more

Has The IC Industry Hit A ‘Red Brick Wall’?
By Mark LaPedus - 19 Jun, 2014 - Comments: 2

In the mid-1980s, the semiconductor industry was in a crisis. Chipmakers were looking for ways to break the magical one-micron barrier. Many thought X-ray lithography would be required to break the barrier, but as it turned out, traditional optical technology did the trick. And the industry marched on. Then, in 2000 or so, the IC industry was nearing the so-called “red brick wall,” which... » read more

EDA Races To 7nm, Despite Litho Uncertainties
By Ann Mutschler - 16 May, 2014 - Comments: 0

It’s becoming almost painful to refer to the delay with EUV, but it certainly isn’t stopping anyone on the design side from tweaking design tools or working on test chips. Clearly, things are moving ahead to 7nm even though lithography plans aren't yet clear. Steve Carlson, group marketing director in Cadence’s Office of Chief Strategy, said with regard to EUV, “They have the power p... » read more

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