Mixed Signals


By Mark LaPedus Based on the various forecasts for semiconductor equipment, the mood is mixed at this week’s Semicon West trade show in San Francisco. In its mid-year forecast, for example, SEMI predicts that the semiconductor equipment market will reach $36.3 billion in 2013, down 1.7% over 2012. But the business is expected to rebound and reach $43.98 billion in 2014, a 21.2 percent inc... » read more

VLSI Kyoto – The SOI Papers


By Adele Hars There were some breakthrough FD-SOI and other excellent SOI-based papers that came out of the 2013 Symposia on VLSI Technology and Circuits in Kyoto (June 10-14, 2013). By way of explanation, VSLI comprises two symposia: one on Technology; one on Circuits. However, papers that are relevant to both were presented in “Jumbo Joint Focus” sessions.  The papers should all b... » read more

FinFET Isolation: Bulk vs. SOI


Terry Hook of IBM recently contributed an article to ASN about FinFET isolation issues on bulk vs. SOI.  It generated immense interest, and created lots of discussion on various LinkedIn groups.  In case you missed it, here it is again. (This article is based on an in-depth presentation Terry gave at the SOI Consortium's Fully-Depleted Tech Workshop, held during VLSI-TSA in Taiwan, April 2... » read more

Design Topology Requires Physical Data


By Ann Steffora Mutschler To best understand a design topology and make decisions on clock/register gating, vector sets are required for the RTL tools to understand how to gate clocks and registers. However, if certain constraints are set on all enabled signals in RTL they can be re-used for gating clocks and registers downstream where enablers are not available—even without needing a ... » read more

The Power Game


By Ann Steffora Mutschler Semiconductor engineering teams always have focused on stepping up performance in new designs, but in the mobile, GPU and tablet markets they’re finding that maintaining the balance between higher performance and the same or lower power is increasingly onerous. The reason: Extreme gaming applications can create scenario files that cause dynamic power consumpt... » read more

Hot Stuff


By Ann Steffora Mutschler When it comes to thermal modeling, which has been practiced for many years, the challenges are daunting. The good news is that approaches are emerging as challenges increased with smaller process nodes and design complexity. Viewed from a number of viewpoints—transistor, chip, package, board and system—thermal models traditionally have been created from m... » read more

Good Pattern Flow Ahead For 14, 10nm


By Ann Steffora Mutschler Given complexity, yield, power and other challenges with leading edge manufacturing, semiconductor foundries increasingly have been forced to require more and more restrictive design rules with each new process node. “They keep adding more design rules and more operations to a particular check to eliminate corner cases where in manufacturing they saw some variant... » read more

Foundry Arms Race Under Way


By Mark LaPedus A year ago, chipmakers were reeling from a severe shortage of 28nm foundry capacity, prompting foundries to ramp up their fabs at a staggering pace. At the time, foundries were unable to keep up with huge and unforeseen demand for mobile chips. The shortfall was also caused by low yields and the overall lack of installed 28nm capacity. Today, the 28nm crunch is largely ov... » read more

SOI Highlights at Common Platform Tech Forum


Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~  ~ The 2013 Common Platform Technology Forum showcased “the latest technological advances being delivered to the world’s leading electronics companies,” so of course SOI-based topics were well-represented. Happily, those of us who weren’t able to get over to Silicon Valley were able to attend “virtually” via a ... » read more

Good Times For Analog Designers


By Ann Steffora Mutschler For a number of technological reasons, analog/mixed-signal design and low-power design are converging, and with that comes both challenges and opportunities. As far as challenges go, process variations at 14nm, 20nm and even 28nm have increased significantly to include DFM impacts such as layout-delay effects. On the digital side, those process changes affect... » read more

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