tag: Lam Research

Impacts Of Process Flow, Scaling, And Variability On Interconnect Performance
By Lam Research - 26 Apr, 2023 - Comments: 0

Virtual fabrication is used to evaluate the performance of interconnects (line and via resistance, capacitance, etc.) across pitches compatible with either EUV single exposure or SADP for three different process flows: single damascene, dual damascene, and semi-damascene (subtractive metal etch). The effects of process variation for the three flows are also investigated to determine the relativ... » read more

A Deposition And Etch Technique To Lower Resistance Of Semiconductor Metal Lines
By Timothy Yang - 20 Apr, 2023 - Comments: 0

Copper's resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) wires is traditionally done by etching a trench pattern in low-k silicon dioxide using a trench etch process, and subsequently filling the trench with Cu via a damascene flow. Unfortunately, this meth... » read more

Blog Review: April 19
By Jesse Allen - 19 Apr, 2023 - Comments: 0

Synopsys' Soren Smidstrup and Kerim Genc explore how materials modeling helps battery designers explore the wide playing field for new battery materials and optimize performance by co-designing the structure and chemistry of new batteries, ultimately shortening development time and cost. Siemens' Stephen Chavez finds that enabling multiple engineers to work simultaneously within the same PCB... » read more

Power Semiconductors: A Deep Dive Into Materials, Manufacturing & Business
By The SE Staff - 03 Apr, 2023 - Comments: 0

Whether you’re the owner of the average smartphone, commuting on trains, or driving around in a Tesla, you use power semiconductor devices every day. In a technology-dependent world, these devices are everywhere, and demand for more types of chips using different materials is growing. In the past, most engineers paid little attention to power semiconductors. They were deemed commodity, off... » read more

Blog Review: March 29
By Jesse Allen - 29 Mar, 2023 - Comments: 0

Siemens' Heather George suggests adopting a shift-left strategy for complex designs that integrate multiple dies into a package and examines the challenges and opportunities for performing comprehensive tests on 2.5D and 3D IC designs. Synopsys' Shekhar Kapoor notes that when considering whether a system will perform as intended, techniques that work well for monolithic SoCs may not be as we... » read more

Tech Forecast: Fab Processes To Watch Through 2040
By Laura Peters - 16 Mar, 2023 - Comments: 0

The massive proliferation of semiconductors in more markets, and more applications within those markets, is expected to propel the industry to more than $1 trillion by 2030. But over the next 17 years, semiconductors will reach well beyond the numbers, changing the way people work, how they communicate, and how they measure and monitor their health and well-being. Chips will be the enabling ... » read more

Getting Smarter About Tool Maintenance
By Anne Meixner - 16 Mar, 2023 - Comments: 0

Chipmakers have begun to shift to predictive maintenance for process tools, but the hefty investment in analytics and engineering efforts means it will take some time for smart maintenance to become a widespread practice. Semiconductor manufacturers need to maintain a diverse set of equipment to process the flow of wafers, dies, packaged parts, and boards running through factories. OSAT and ... » read more

New Challenges Emerge With High-NA EUV
By Katherine Derbyshire - 16 Mar, 2023 - Comments: 3

High numerical aperture EUV exposure systems are coming — as soon as 2025 by some estimates. Though certainly a less profound change than the introduction of extreme ultraviolet lithography, high-NA lithography still brings a new set of challenges for photoresists and related materials. With a higher numerical aperture, photons strike the wafer at a shallower angle. That requires thinner p... » read more

A Comparative Evaluation Of DRAM Bit-Line Spacer Integration Schemes
By Dempsey Deng - 16 Mar, 2023 - Comments: 0

With decreasing dynamic random-access memory (DRAM) cell sizes, DRAM process development has become increasingly difficult. Bit-line (BL) sensing margins and refresh times have become problematic as cell sizes have decreased, due to an increase in BL parasitic capacitance (Cb). The main factor impacting Cb is the parasitic capacitance between the BL and the node contact (CBL-NC) [1]. To reduce ... » read more

Chip Industry’s Technical Paper Roundup: Mar. 14
By Linda Christensen - 14 Mar, 2023 - Comments: 0

New technical papers recently added to Semiconductor Engineering’s library: [table id=86 /] If you have research papers you are trying to promote, we will review them to see if they are a good fit for our global audience. At a minimum, papers need to be well researched and documented, relevant to the semiconductor ecosystem, and free of marketing bias. There is no cost involved for us ... » read more

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