tag: imec

Chasing After Carbon Nanotube FETs
By Mark LaPedus - 18 Mar, 2021 - Comments: 6

Carbon nanotube transistors are finally making progress for potential use in advanced logic chips after nearly a quarter century in R&D. The question now is whether they will move out of the lab and into the fab. Several government agencies, companies, foundries, and universities over the years have been developing, and are now making advancements with carbon nanotube field-effect transi... » read more

Deep Learning (DL) Applications In Photomask To Wafer Semiconductor Manufacturing
By eBeam Initiative - 17 Mar, 2021 - Comments: 0

The Survey: 2021 Deep Learning Applications List by eBeam Initiative members is a list of current deep learning efforts that are being used in photomask to wafer semiconductor manufacturing. Examples come from ASML, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, Siemens Industries Software, Inc., Siemens EDA, STMicroelectronics, and TASMIT. Published by the eBeam Initiative Membe... » read more

The Future Of FinFETs At 5nm And Beyond
By Assawer Soussou - 05 Mar, 2021 - Comments: 0

While contact gate pitch (GP) and fin pitch (FP) scaling continues to provide higher performance and lower power to finFET platforms, controlling RC parasitics and achieving higher transistor performance at technology nodes of 5nm and beyond becomes challenging. In collaboration with Imec, we recently used SEMulator3D virtual fabrication to explore an end-to-end solution to better underst... » read more

Making Sense Of New Edge-Inference Architectures
By Bryon Moyer - 04 Mar, 2021 - Comments: 0

New edge-inference machine-learning architectures have been arriving at an astounding rate over the last year. Making sense of them all is a challenge. To begin with, not all ML architectures are alike. One of the complicating factors in understanding the different machine-learning architectures is the nomenclature used to describe them. You’ll see terms like “sea-of-MACs,” “systolic... » read more

Manufacturing Bits: March 2
By Mark LaPedus - 02 Mar, 2021 - Comments: 0

Next-gen AFM At the recent SPIE Advanced Lithography conference, Imec, Infinitesima and others described a new metrology tool technology called a Rapid Probe Microscope (RPM). Infinitesima has shipped its first RPM 3D system, enabling three-dimensional (3D) metrology applications for leading-edge chips. The system was jointly developed with Imec. In the IEDM paper, Imec and Infinitesima... » read more

Breaking The 2nm Barrier
By Mark LaPedus - 18 Feb, 2021 - Comments: 4

Chipmakers continue to make advancements with transistor technologies at the latest process nodes, but the interconnects within these structures are struggling to keep pace. The chip industry is working on several technologies to solve the interconnect bottleneck, but many of those solutions are still in R&D and may not appear for some time — possibly not until 2nm, which is expected t... » read more

FeFETs Bring Promise And Challenges
By Bryon Moyer - 17 Feb, 2021 - Comments: 3

Ferroelectric FETs (FeFETs) and memory (FeRAM) are generating high levels of interest in the research community. Based on a physical mechanism that hasn’t yet been commercially exploited, they join the other interesting new physics ideas that are in various stages of commercialization. “FeRAM is very promising, but it's like all promising memory technologies — it takes a while to get b... » read more

Week In Review: Manufacturing, Test
By Mark LaPedus - 12 Feb, 2021 - Comments: 0

Chipmakers The U.S. Semiconductor Industry Association (SIA) and several chip executives have sent a joint letter to President Biden, urging the administration to include substantial funding for semiconductor manufacturing and research in the U.S. As reported, the share of global semiconductor manufacturing capacity in the U.S. has decreased from 37% in 1990 to 12% today. “Semiconductors pow... » read more

DRAM’s Persistent Threat To Chip Security
By Bryon Moyer - 10 Feb, 2021 - Comments: 0

A well-known DRAM vulnerability called "rowhammer," which allows an assailant to disrupt or take control of a system, continues to haunt the chip industry. Solutions have been tried, and new ones are being proposed, but the potential for a major attack persists. First discovered some five years ago, most of the efforts to eliminate the "rowhammer" threat have done little more than mitigate t... » read more

Manufacturing Bits: Feb. 2
By Mark LaPedus - 02 Feb, 2021 - Comments: 0

Capacitor-less DRAM At the recent 2020 International Electron Devices Meeting (IEDM), Imec presented a paper on a novel capacitor-less DRAM cell architecture. DRAM is used for main memory in systems, and today’s most advanced devices are based on roughly 18nm to 15nm processes. The physical limit for DRAM is somewhere around 10nm. DRAM itself is based on a one-transistor, one-capacito... » read more

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