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Rapid Thermal Anneal (RTA), Rapid Thermal Processing (RTP)

The process of rapidly heating wafers.
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Description

Rapid thermal anneal (RTA), also called rapid thermal processing (RTP), is a semiconductor manufacturing process in which silicon wafers are rapidly heated to high temperatures of over 1,000 °C. The process of heating takes several seconds or less. The wafer is then cooled slowly to prevent breakage due to thermal shock.

Heat lamps are often used for the heating process. Another heating method involves placing the wafer in close proximity to a heated thermal mass. Temperature measurement and control sensors used include thermocouples and pyrometers.

RTP is used for dopant activation, thermal oxidation, metal reflow, silicide and barrier metal formation, chemical vapor deposition, and other steps in semiconductor manufacturing.