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Multi-Beam eBeam Lithography

An advanced form of e-beam lithography
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Description

Multi-beam e-beam lithography is an advanced form of e-beam, maskless or direct-write lithography. Instead of a single-beam e-beam, multi-beam e-beam makes use of multiple beams within a single tool. The idea is to boost the throughputs in direct-write lithography applications. It is also attractive because it enables fine resolutions without the need of a photomask.