Knowledge Center
Knowledge Center

Multi-Beam eBeam Lithography

An advanced form of e-beam lithography


Multi-beam e-beam lithography is an advanced form of e-beam, maskless or direct-write lithography. Instead of a single-beam e-beam, multi-beam e-beam makes use of multiple beams within a single tool. The idea is to boost the throughputs in direct-write lithography applications. It is also attractive because it enables fine resolutions without the need of a photomask.