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Optical Lithography

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Optical lithography is the mainstream patterning technology in today’s fabs. A scanner makes use of an optical projection lens and a deep ultraviolet excimer laser to produce light across a spectrum of wavelengths. The most common lasers are based on krypton fluoride at 248nm wavelengths and argon fluoride at 193nm wavelengths.

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Variation At 10/7nm

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Tech Talk: 7nm Litho

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Tech Talk: Double-Triple Patterning

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Next-Generation Lithography