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Chemical Vapor Deposition

A process used to develop thin films and polymer coatings.
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Description

Chemical vapor deposition, or CVD, is a commonly used method of creating thin films used in semiconductor manufacturing.

Chemical vapor deposition is a process that can trace its roots back to a 1950s method of creating polymer coatings. The coating material is vaporized inside a vacuum chamber and begins to uniformly settle on the substrate.

There are a number of knobs to turn in this kind of process, including heat, different precursor materials, and different substrates.


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